My Report

Advanced Machining and Processes Mock Test 3


Correct Answer: 2 points | Wrong: -1 point
Grades: A* (100% score) | A (80%-99%) | B (60%-80%) | C (40%-60%) | D (0%-40%)
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 10%

Question 1 of 10

1. Which of the following can be easily removed using Chemical milling process?

Question 1 of 10

Question 2 of 10

2. During Chemical milling, depth of etch is controlled by which factor of immersion?

Question 2 of 10

Question 3 of 10

3. State which of the following statement is true or false regarding Chemical milling.
“Maskants are generally used in CHM, to protect the work piece from the etching chemical agent.”

Question 3 of 10

Question 4 of 10

4. Which of the following processes cannot be machined using Magnetic abrasive finishing?

Question 4 of 10

Question 5 of 10

5. Scribing plates are used to define, which of the following parameters in Chemical milling?

Question 5 of 10

Question 6 of 10

6. Which of the following factors does not affect the magnetic abrasive conglomerates in MAF?

Question 6 of 10

Question 7 of 10

7. Which of the following is not a magnetic field assisted machining process?

Question 7 of 10

Question 8 of 10

8. State whether the following statement is true or false about Magnetic abrasive finishing.
“Higher rates of material removal are obtained, with an increase in amplitude and frequency.”

Question 8 of 10

Question 9 of 10

9. Which of the following industries use Ice jet machining for different applications?

Question 9 of 10

Question 10 of 10

10. What is the value of frequency used in Magnetic abrasive finishing process?

Question 10 of 10


 

Manish Bhojasia - Founder & CTO at Sanfoundry
Manish Bhojasia, a technology veteran with 20+ years @ Cisco & Wipro, is Founder and CTO at Sanfoundry. He lives in Bangalore, and focuses on development of Linux Kernel, SAN Technologies, Advanced C, Data Structures & Alogrithms. Stay connected with him at LinkedIn.

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