My Report

Manufacturing Processes II Practice Test 2


Correct Answer: 2 points | Wrong: -1 point
Grades: A* (100% score) | A (80%-99%) | B (60%-80%) | C (40%-60%) | D (0%-40%)
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1. In the dry etch process, gases are _____

2. For silicon oxide etching, usually ______________ is used.

3. In order to obtain good results in ECM, _____

4. Which of the following does not hold true?

5. Which of the following holds true about electro-chemical machining?

6. For ECM of steel which is used as the electrolyte?

7. In ECM, workpiece acts as a cathode.

8. The resist layer used to protect the wafer does not get etched.

9. Which of the following holds true about wet etching?

10. Electrolyte should carry away the heat generated and products of the reaction.


 

Manish Bhojasia - Founder & CTO at Sanfoundry
Manish Bhojasia, a technology veteran with 20+ years @ Cisco & Wipro, is Founder and CTO at Sanfoundry. He lives in Bangalore, and focuses on development of Linux Kernel, SAN Technologies, Advanced C, Data Structures & Alogrithms. Stay connected with him at LinkedIn.

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